/ E-beam evaporator


The electron-beam evaporator is used to deposit metals and dielectrics. It can deposit up to 6 materials successively while the thickness is precisely controlled by a microbalance. It is also possible to replace the materials after each deposition.

-Deposition of metals and dielectrics on small samples

Substrates : Any except plastics and photoresins

Sample holder : 4 in. diameter

Base pressure : 1×10-6 torr

Pumping time : 1h

Crucible – sample holder distance : 10 in

Number of crucibles : 6

Volume of crucibles : 1 cm3

Deposition rate : 1 – 10 Angströms / s

Manufacturer : Edwards

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