Description
The electron-beam evaporator is used to deposit metals and dielectrics. It can deposit 6 materials successively while the thickness is precisely controlled with a microbalance. It is also possible to replace the materials after each deposition. The short distance between the crucible and the sample holder provides a high deposition rate, at the expense of uniformity.Uses
- Deposition of metals and dielectrics on small samples
Technical specifications
| Substrates : | Any except plastics and photoresins |
| Sample holder : | 4 in. diameter |
| Base pressure : | 1x10-6 torr |
| Pumping time : | 1h |
| Crucible – sample holder distance : | 10 in |
| Number of crucibles : | 6 |
| Volume of crucibles : | 1 cm3 |
| Deposition rate : | 1 - 10 Angströms / s |
| Manufacturer : | Edwards |