Description

Ellipsometry uses the polarization change undergone by an optical wave during reflection from a surface. It provides a great deal of information on the material such as the refraction index, the chemical composition and the electrical conductivity. We can also determine the thickness of a film, provided it is between a few tens of nanometer and a few microns. Ellipsometry is a non-contact, non-destructive method

Uses Determine the refraction index of a thin film Measure the thickness of an optical coating Measure the roughness Determine the birefringence Measure concentration or dopant gradients

Technical specifications

Resolution / sensitivity :	1.6 – 6 nm, 1 cm-1 (IR)
Depth resolution :	≤ 1 nm (depends on the model and the material)
Lateral resolution :	3 – 10 mm
Other characteristics :	Spectral range : 245 nm – 33 µm
Manufacturer :	J.A. Woollam Co.
Model :	VASE, M-2000UI, M44, IR-VASE