22 November 2010, École Polytechnique, Montréal, Canada
Course Objectives
- Learn about commonly used analytical techniques for surface analysis and thin film analysis, including XPS and TOF-SIMS.
- Know the advantages and limitations of each technique.
- Know typical applications of surface analysis in the industry.
- Understand and be able to interpret the data provided by each technique.
Course contents
This course aims to provide the participants with a good understanding of the uses, strengths and limitations of the major surface analysis techniques for determining the composition and structure of materials and thin films. The main focus of the course is on the applications of the methods, in an industrial environment.
The methods covered are mainly X-ray Photoelectron Spectroscopy (XPS), Secondary Ion Mass Spectroscopy (SIMS), Auger Electron Spectroscopy (AES) and Ion Scattering Spectrocopy (including Rutherford backscattering spectroscopy (RBS)). The principles behind each technique are first detailed, followed by practical examples from many industrial sectors such as wafer manufacturing, semiconductor and thin films.
The course then compares the methods in terms of sensitivity, depth profiled, resolution, etc. After the course, the student should be able to pick the best method for a particular analysis.
Who should attend?Chemists, physicists, engineers and others who want to learn more about common chemical analysis techniques.
Instructor:Alain Rochefort, professor at École Polytechnique.
Registration fees:
450$ through November 17th, 525$ after November 17th
Lunch is included in the registration fee.
Schedule
November 22nd, 2010
9:00 to 12:00 and 1:00 to 3:30 : short course
3:30 to 4:30: laboratory tour
Registration
Additional Information
Jacqueline Sanchez
514-340-4711 #7458
jacqueline.sanchez@umontreal.ca