Description

High power pulsed magnetron sputtering is a method used for the physical deposition of thin films. The HIPIMS produces high power pulses with durations of several tenths of a second. This technique is particularly useful for depositing high-density microstructures. Furthermore, by pre-treating the substrate, it is possible to significantly increase the adhesion of the deposit.

Uses Thin film deposition Hard coatings, optical coatings deposition

Technical specifications

Diameter of the sample holder:	4 inches
Available gases:	Ar, N2, O2
Deposition rate:	0.1 – 1 nm/s
Control of the thickness:	5%
Substrate temperature:	250 0C
Base pressure:	5 x 10-7 torr
Manufacturer :	Huttinger