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Groupe de recherche en physique et technologie des couches minces (GCM)

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Gold thermal evaporator

Description

In thermal evaporation, the material to deposit is put in a crucible that is heated by the Joule effect. The material evaporates and is then deposited on the substrate.

Uses

  • Thin film deposition of gold

Technical specifications

Substrates : Semiconductors, metals, plastics
Crucible – sample holder distance : 5 in
 

Services to researchers

Overview
Materials analysis
Microfabrication processes
Microfabrication equipment
Mask aligner
Sputtering and e-beam evaporation system
Magnetron sputterer
E-beam evaporator
ECR-PECVD
High power impulse magnetron sputtering (HIPIMS)
Cathodic arc deposition
Dual Ion Beam Sputtering (DIBS)
Plasma Enhanced Chemical Vapour Deposition (PECVD)
Aluminum thermal evaporator
Gold thermal evaporator
Parylene deposition system
Deep Reactive Ion Etching (DRIE-ICP)
Reactive Ion Etching (RIE)
Focused Ion Beam (FIB)
Wet etching - Wet bench
Supercritical drying
Rapid Thermal Annealing (RTA)
UV ozonizing oven
Mass spectrometer
Rates

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