Description
The Karl Suss MA-4 has been designed for high-accuracy photolithography in a lab environment. It can handle masks up to 5 inches in diameter, of regular or irregular shapes.
 |
Uses
- Photolithography
- Exposition of various resins
|
Technical specifications
| Alignment of masks : |
4 inches |
| Alignment of masks : |
4 inches |
| Contact modes : |
5 (hard vacuum to proximity) |
| Lamp : |
350W Hg |
| Optic : |
UV 400 (lines 436 – 405 – 365 nm) |
| Insolation : |
Power or constant intensity |
| Alignment : |
FAV/FAR infrared |
| |
|
| Manufacturer : |
Karl Suss |
| Model : |
MA-4 |