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Groupe de recherche en physique et technologie des couches minces (GCM)

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Microfabrication equipment

The GCM possesses a large array of microfabrication instruments :

Photolithography

  • Mask aligner

Thin Film Deposition




  • Sputtering and e-beam evaporation system
  • Magnetron sputterer
  • E-beam evaporator
  • ECR-PECVD
  • High power pulsed magnetron sputtering
  • Cathodic arc deposition
  • Dual ion beam sputtering (DIBS)
  • Plasma enhanced chemical vapor deposition (PECVD)
  • Aluminum thermal evaporator
  • Gold thermal evaporator
  • Parylene deposition system

Etching

  • Deep Reactive Ion Etching (DRIE-ICP)
  • Reactive Ion Etching (RIE)
  • Focused Ion Beam (FIB)
  • Wet etching / wet bench

Miscellaneous

  • Supercritical drying
  • Rapid Thermal Annealing (RTA)
  • UV ozonizing oven
  • Mass spectrometer
 

Services to researchers

Overview
Materials analysis
Microfabrication processes
Microfabrication equipment
Mask aligner
Sputtering and e-beam evaporation system
Magnetron sputterer
E-beam evaporator
ECR-PECVD
Aluminum thermal evaporator
Gold thermal evaporator
Parylene deposition system
Deep Reactive Ion Etching (DRIE-ICP)
Reactive Ion Etching (RIE)
Focused Ion Beam (FIB)
Wet etching - Wet bench
Supercritical drying
Rapid Thermal Annealing (RTA)
UV ozonizing oven
High power impulse magnetron sputtering
Cathodic arc deposition
Dual Ion Beam Sputtering (DIBS)
Plasma Enhanced Chemical Vapour Deposition (PECVD)
Mass spectrometer
Rates

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